Firma en Digital.CSIC (*)
Campabadal, Francesca
 
Centro o Instituto
CSIC - Instituto de Microelectrónica de Barcelona (IMB-CNM)
 
Categoría Profesional
Profesora de Investigación
 
Especialización
Silicon technology, electron devices
 
Email
francesca.campabadal@imb-cnm.csic.es
 
 
Perfil en Google Scholar
 
WoS ResearcherID - Publons
 
Scopus AuthorID
 
Otros identificadores (con url)
 

Resultados 1-20 de 20.

DerechosPreviewFecha Public.TítuloAutor(es)Tipo
1openAccess19-sep-2011Ultra-thin ALD layers of HfO2 for silicon micromachiningDuch, M.; Gerbolés, Marta; Acero Leal, María Cruz CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; Campabadal, Francesca CSIC ORCID póster de congreso
2closedAccessaccesoRestringido.pdf.jpg8-feb-2017Top electrode dependence of the resistive switching behavior in HfO2/n+Si-based devicesMuñoz-Gorriz, J.; Acero Leal, María Cruz CSIC ORCID ; González, M. B.; Campabadal, Francesca CSIC ORCID póster de congreso
3closedAccessaccesoRestringido.pdf.jpg8-feb-2017Resistive Switching with Bipolar Characteristics in TiN/Ti/HfO2/W DevicesPoblador, Samuel CSIC ORCID ; Acero Leal, María Cruz CSIC ORCID ; González, M. B.; Campabadal, Francesca CSIC ORCID comunicación de congreso
4openAccessPhysical degradation.pdf.jpg14-nov-2018Physical characterization of filamentary structures in TiN/Ti/HfO2/W memristor devicesPoblador, Samuel CSIC ORCID ; Maestro, Marcos; Acero Leal, María Cruz CSIC ORCID ; González, M. B.; Campabadal, Francesca CSIC ORCID póster de congreso
5openAccessOne-way_Sensitivity_Analysis_of_the_Quasi-static_Memdiode_Model_for_RRAM_Devices.pdf.jpg12-sep-2021One-way Sensitivity Analysis of the Quasi-static Memdiode Model for RRAM DevicesSalvador, E.; González, M. B.; Campabadal, Francesca CSIC ORCID ; Martín-Martínez, J.; Rodríguez, R.; Miranda, E.comunicación de congreso
6closedAccessaccesoRestringido.pdf.jpg8-feb-2017Ni/HfO2/Si resistive switching structures: A device level and nanoscale analysis with CAFMClaramunt, S.; Wu, Q.; Maestro, Marcos; Porti, M.; Acero Leal, María Cruz CSIC ORCID ; González, M. B.; Martín-Martínez, Javier; Campabadal, Francesca CSIC ORCID ; Nafría, Montserratpóster de congreso
7openAccess11-feb-2015Investigation of the resistive switching behavior in Ni/HfO2-based RRAM devicesGonzález, M. B.; Acero Leal, María Cruz CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; Campabadal, Francesca CSIC ORCID comunicación de congreso
8openAccess3-abr-2017Investigation of the multilevel capability of TiN/Ti/HfO2/W RRAM devices by pulse programmingGonzález, M. B.; Poblador, Samuel CSIC ORCID ; Mallol, M. M.; Calvo, J.; Zabala, Miguel; Acero Leal, María Cruz CSIC ORCID ; Campabadal, Francesca CSIC ORCID comunicación de congreso
9openAccessExploring the Multilevel Capabiblity of TIN.pdf.jpg27-jun-2016Exploring the Multilevel Capabiblity of TIN/Ti/HfO2/W RRAM Devices by Pulse ProgrammingGonzález, M. B.; Acero Leal, María Cruz CSIC ORCID ; Calvo Angos, José; Zabala, Miguel; Campabadal, Francesca CSIC ORCID comunicación de congreso
10openAccessElectrical characterization of TiN.pdf.jpg7-nov-2017Electrical characterization of TiN/Ti/HfO2/W resistive switching devicesPoblador, Samuel CSIC ORCID ; Acero Leal, María Cruz CSIC ORCID ; Mallol, M. M.; González, M. B.; Campabadal, Francesca CSIC ORCID comunicación de congreso
11openAccessoct-2017Electrical characterization of defects created by ¿-radiation in HfO2-based MIS structuresGarcía, Héctor; Castán, H.; Dueñas, S.; González, M. B.; Campabadal, Francesca CSIC ORCID ; Acero Leal, María Cruz CSIC ORCID ; Sambuco Salomone, L.; Faigón, A.póster de congreso
12openAccessElectrical characterization and resistive switching behavior.pdf.jpg14-nov-2018Electrical characterization and resistive switching behavior of HfO2/Al2O3 multilayer stacksMaestro, Marcos; Poblador, Samuel CSIC ORCID ; Zabala, Miguel; Acero Leal, María Cruz CSIC ORCID ; González, M. B.; Campabadal, Francesca CSIC ORCID póster de congreso
13openAccessEffect of the blistering of ALD Al2O3 films on the silicon.pdf.jpg11-feb-2015Effect of the blistering of ALD Al2O3 films on the silicon surface in Al-Al2O3-Si structuresAcero Leal, María Cruz CSIC ORCID ; Beldarrain, O.; Duch, M.; Zabala, Miguel; González, M. B.; Campabadal, Francesca CSIC ORCID póster de congreso
14openAccess20-jun-2018Effect of Resistive Switching Cycling on the Physical Characteristics of Ni/HfO2/n+-Si RRAM DevicesMuñoz-Gorriz, J.; Acero Leal, María Cruz CSIC ORCID ; González, M. B.; Campabadal, Francesca CSIC ORCID ; Miranda, E.póster de congreso
15openAccessDedicated Random Telegraph Noise Characterization.pdf.jpg29-jun-2015Dedicated Random Telegraph Noise Characterization of Ni/HfO2-based RRAM DevicesGonzález, M. B.; Martín-Martínez, Javier; Rodríguez, Rosana; Acero Leal, María Cruz CSIC ORCID ; Nafría, Montserrat; Campabadal, Francesca CSIC ORCID ; Aymerich, Xaviercomunicación de congreso
16openAccessComparison between Al2O3 thin films grown by ALD.pdf.jpg8-feb-2011Comparison between Al2O3 thin films grown by ALD using H2O or O3 as oxidant sourceCampabadal, Francesca CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; Acero Leal, María Cruz CSIC ORCID ; Rafí, J. M. CSIC ORCID comunicación de congreso
17openAccessBlistering of ALD.pdf.jpg28-sep-2015Blistering of ALD Al2O3 films in Al-Al2O3-Si structuresCampabadal, Francesca CSIC ORCID ; Acero Leal, María Cruz CSIC ORCID ; Beldarrain, O.; Duch, M.; Zabala, Miguel; González, M. B.póster de congreso
18openAccessAssessment of resistive switching characteristics on different.pdf.jpg11-jun-2018Assessment of resistive switching characteristics on different HfO2/Al2O3 dielectric stacksMaestro, Marcos; Poblador, Samuel CSIC ORCID ; Zabala, Miguel; Acero Leal, María Cruz CSIC ORCID ; González, M. B.; Campabadal, Francesca CSIC ORCID póster de congreso
19closedAccessaccesoRestringido.pdf.jpg9-jun-2014Analysis of the temperature dependence of the switching variability in Ni/HfO2-based RRAM devicesGonzález, M. B.; Rafí, J. M. CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; Acero Leal, María Cruz CSIC ORCID ; Campabadal, Francesca CSIC ORCID comunicación de congreso
20closedAccessaccesoRestringido.pdf.jpg8-feb-2017Advanced electrical characterization of atomic layer deposited Al2O3 MIS-based structuresGarcía, Héctor; Castán, H.; Dueñas, S.; González, M. B.; Acero Leal, María Cruz CSIC ORCID ; Campabadal, Francesca CSIC ORCID comunicación de congreso