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Título: | High reflectance ta-C coatings in the extreme ultraviolet |
Autor: | Larruquert, Juan Ignacio CSIC ORCID; Rodríguez de Marcos, Luís CSIC ORCID; Méndez, José Antonio CSIC; Martín, P. J.; Bendavid, A. | Palabras clave: | Extreme Ultraviolet Optical constants Thin films Optical properties Mirrors Space optics Free-electron lasers, FELs |
Fecha de publicación: | 2013 | Editor: | Optical Society of America | Citación: | Optics Express 21: 27537-27549 (2013) | Resumen: | The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp3 atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard singlelayer coating materials in the EUV spectral range below 130 nm. A selfconsistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors. © 2013 OSA | URI: | http://hdl.handle.net/10261/91646 | DOI: | 10.1364/OE.21.027537 | Identificadores: | doi: 10.1364/OE.21.027537 issn: 1094-4087 |
Aparece en las colecciones: | (CFMAC-IO) Artículos |
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