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dc.contributor.authorStankiewicz, Jolanta-
dc.contributor.authorVilluendas, Francisco-
dc.contributor.authorAlcalá, Rafael-
dc.date.accessioned2012-03-29T12:37:49Z-
dc.date.available2012-03-29T12:37:49Z-
dc.date.issued2010-05-
dc.identifier.citationApplied Physics Letters 96(19): 192108 (2010)es_ES
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10261/47692-
dc.description3 páginas, 4 figuras.es_ES
dc.description.abstractWe report p-type conductivity in intrinsic indium oxide (IO) films deposited by magnetron sputtering on fused quartz substrates under oxygen-rich ambient. Highly oriented (111) films were studied by x-ray diffraction, optical absorption, and Hall effect measurements. We fabricated p-n homojunctions on these films.es_ES
dc.description.sponsorshipWe acknowledge support from Grant No. MAT2008/03074, from the Ministerio de Ciencia e Innovación of Spain. Additional support from Diputación General de Aragón (DGA-IMANA) is also acknowledged.es_ES
dc.language.isoenges_ES
dc.publisherAmerican Institute of Physicses_ES
dc.rightsopenAccesses_ES
dc.titlep-type conduction in sputtered indium oxide filmses_ES
dc.typeartículoes_ES
dc.identifier.doi10.1063/1.3430035-
dc.description.peerreviewedPeer reviewedes_ES
dc.relation.publisherversionhttp://dx.doi.org/10.1063/1.3430035es_ES
dc.identifier.e-issn1077-3118-
dc.type.coarhttp://purl.org/coar/resource_type/c_6501es_ES
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.grantfulltextopen-
item.openairetypeartículo-
item.fulltextWith Fulltext-
item.languageiso639-1en-
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