Photochemical solution deposition of lead-based ferroelectric films: Avoiding the PbO-excess addition at last

Abstract

A method was demonstrated for photochemical solution deposition of lead-based ferroelectric films without PbO addition. The films developed from a stoichimetric (Pb0.76Ca0.24)TiO3 solution by UB sol-gel photoannealing at 450 °C. The study found that nanometric grains of size below 50 nm form the microstructure of these films. The study observed that processing of gel film under UV irradiation is responsible for formation of the crystalline oxide phase at 450 °C without any PbO excess. The study also found that the short range diffusion of elements leads to the stabilization of metastable phases in the films. The low temperature for crystallization of the films can prevent the reoxidation and a ferro-paraelectric transition is observed for films showing different amount of PbO.