Por favor, use este identificador para citar o enlazar a este item:
http://hdl.handle.net/10261/57544
COMPARTIR / EXPORTAR:
SHARE CORE BASE | |
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL | DATACITE | |
Título: | On the growth of LiF films by Pulsed Laser Deposition |
Autor: | Perea, Ángel CSIC ORCID; Gonzalo, J. CSIC ORCID; Afonso, Carmen N. CSIC ; Martelli, S.; Montereali, R.M. | Fecha de publicación: | 1999 | Editor: | Elsevier | Citación: | Applied Surface Science 138-139: 533- 537 (1999) | Resumen: | The production of Lithium fluoride (LiF) films by Pulsed Laser Deposition is reported for the first time. The influence of several deposition parameters such as the laser energy density, the presence of a gas pressure (10-1 mbar of He) and the substrate temperature on the film quality is studied by using in-situ reflectivity measurements, Scanning Electron Microscopy and X-ray diffraction. Films deposited in vacuum are polycrystalline and fully textured along the (100) orientation, whereas those grown in He pressure present a more complicated structure. Films are generally rough, the roughness decreasing as the substrate temperature increases or the laser energy density decreases. The origin of this roughness is discussed in terms of the ablation mechanism taking place at the target. © 1999 Elsevier Science B.V. All rights reserved. | URI: | http://hdl.handle.net/10261/57544 | DOI: | 10.1016/S0169-4332(98)00449-8 | Identificadores: | doi: 10.1016/S0169-4332(98)00449-8 issn: 0169-4332 |
Aparece en las colecciones: | (CFMAC-IO) Artículos |
Ficheros en este ítem:
Fichero | Descripción | Tamaño | Formato | |
---|---|---|---|---|
accesoRestringido.pdf | 15,38 kB | Adobe PDF | Visualizar/Abrir |
CORE Recommender
SCOPUSTM
Citations
28
checked on 19-abr-2024
WEB OF SCIENCETM
Citations
23
checked on 24-feb-2024
Page view(s)
256
checked on 26-abr-2024
Download(s)
101
checked on 26-abr-2024
Google ScholarTM
Check
Altmetric
Altmetric
NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.