English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/22353
Title: Patterning of silicon surfaces with noncontact atomic force microscopy: Field-induced formation of nanometer-size water bridges
Authors: García García, Ricardo; Calleja, Montserrat ; Rohrer, Heinrich
Issue Date: Apr-1999
Publisher: American Institute of Physics
Citation: Journal of Applied Physics 86(4): 1898 (1999)
Abstract: Nanometer-size water bridges have been used to confine the oxidation of silicon surfaces with a noncontact atomic force microscope. The formation of a water bridge between two surfaces separated by a gap of a few nanometers is driven by the application of an electrical field. Once a liquid bridge is formed, its length and neck diameter can be modified by changing the tip-sample separation. The liquid bridge provides the ionic species and the spatial confinement to pattern Si(100) surfaces in noncontact force microscopy. The method is applied to write arrays of several thousands dots with a periodicity of 40 nm and an average width of 10 nm.
Description: 6 pages, 9 figures.
Publisher version (URL): http://dx.doi.org/10.1063/1.370985
URI: http://hdl.handle.net/10261/22353
DOI: 10.1063/1.370985
ISSN: 0021-8979
Appears in Collections:(IMM-CNM) Artículos
(LFSPyN) Artículos
Files in This Item:
File Description SizeFormat 
httpGetPDFServlet.pdf421,58 kBAdobe PDFThumbnail
Show full item record

WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.