Micron-scale wedge thin films prepared by plasma enhanced chemical vapor deposition

Abstract

Wedge-shaped materials are currently employed for optical analyses and sensing applications. In this paper, we present an easy to implement plasma enhanced chemical vapor deposition procedure to grow wedge-shaped thin films with controlled slope at the scale of few hundred microns. The method relies on the use of few tenths micron height obstacles to alter the laminar flow of precursor gas during deposition and is applied for the fabrication of wedge-shaped ZnO thin films. Local interference patterns, refractive index, and birefringence of the films have been measured with one micron resolution using a specially designed optical set-up. Their micro- and nano-structures have been characterized by means of scanning electron microscopy and theoretically reproduced by Monte Carlo calculations.