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Título: | Structure of TiAlN reactive sputtered coatings |
Autor: | Denisov, V.N.; Mavrin, B.B.; Vinogradov, E.A.; Polyakov, S.N.; Kiricjenko, A.N.; Gogolinsky, K.V.; Useinov, A.S.; Blank, V.D.; Godinho, V. CSIC ORCID; Fernández-Camacho, A. CSIC ORCID | Fecha de publicación: | 2012 | Citación: | Journal of Nano- and Electronic Physics 4: 1- 4 (2012) | Resumen: | The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm -1 or in the region of 830 - 850 cm -1 depending on the deposition parameters whereas it is not exceed 630 cm -1 from TiAlN of NaCl structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiN x] with x = 5 and x = 4. The chains of polyhedra [TiN x] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N 2 gas. © 2012 Sumy State University. | URI: | http://hdl.handle.net/10261/98004 | Identificadores: | issn: 2077-6772 |
Aparece en las colecciones: | (ICMS) Artículos |
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