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Atomistic model of ultra-smooth amorphous thin film growth by low-energy ion-assisted physical vapour deposition

AuthorsÁlvarez, Rafael ; Vázquez, Luis ; Redondo-Cubero, A.; Cotrino, José ; Palmero, Alberto
Issue Date2013
PublisherInstitute of Physics Publishing
CitationJournal of Physics D: Applied Physics 46(39): 395303 (2013)
AbstractThe growth of ultra-smooth amorphous thin films induced by low-energy (below 1 keV) ion-assistance processes is studied. The relative contribution of ion-induced smoothening effects is analysed by means of a Monte Carlo model and experimental data. In general, highly rough granular or ultra-smooth (with roughness below one monolayer) films are produced depending on the competition between surface shadowing and ion-induced adatom mobility and sputtering. The ultra-smooth growth regime is experimentally and theoretically consistent with the Edwards–Wilkinson growth mode, which is related to the ion-induced enhancement of surface mobility. Overall, the framework and the fundamentals to analyse this type of growth are developed and discussed.
Identifiersdoi: 10.1088/0022-3727/46/39/395303
issn: 0022-3727
e-issn: 1361-6463
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