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Título: | High-pressure Raman scattering of CdO thin films grown by metal-organic vapor phase epitaxy |
Autor: | Oliva, Ramón; Ibáñez Insa, Jordi CSIC ORCID ; Artús, Lluís CSIC ORCID ; Cuscó, Ramón CSIC ORCID ; Zúñiga-Pérez, J.; Muñoz-Sanjosé, V. | Fecha de publicación: | 2013 | Editor: | American Institute of Physics | Citación: | Journal of Applied Physics 113: 053514 (2013) | Resumen: | We have performed Raman-scattering measurements under high hydrostatic pressure on CdO thin films grown by metal-organic vapor phase epitaxy on sapphire substrates. The pressure dependence of the second-order Raman bands is discussed in terms of ab initio lattice-dynamical calculations, which allow us to obtain mode Grüneisen parameters for the zone-center TO and LO modes of CdO. Our experiments and calculations suggest that at low pressures (<4¿GPa) the Raman spectra are dominated by second-order modes, while at higher pressures (>4¿GPa) the spectra mainly display contributions from disorder-activated first-order modes. | Versión del editor: | http://dx.doi.org/10.1063/1.4790383 | URI: | http://hdl.handle.net/10261/93140 | DOI: | 10.1063/1.4790383 | Identificadores: | doi: 10.1063/1.4790383 issn: 0021-8979 |
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Oliva 2013 Journal of Applied Physics 113.pdf | 766,98 kB | Adobe PDF | Visualizar/Abrir |
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