English   español  
Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/87649
Compartir / Impacto:
Estadísticas
Add this article to your Mendeley library MendeleyBASE
Citado 2 veces en Web of Knowledge®  |  Ver citas en Google académico
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar otros formatos: Exportar EndNote (RIS)Exportar EndNote (RIS)Exportar EndNote (RIS)
Título

Low temperature electron cyclotron resonance plasma technique for low loss integrated optics

Autor Pernas, P. L.; Ruíz, E.; Hernández, M. J.; Garrido, J.; García, B. J.; Castaño, J. L.; Requejo, J. M.; Solís Céspedes, Javier ; Serna, Rosalía ; Afonso, Carmen N.
Fecha de publicación 2000
EditorElsevier
Citación Microelectronic Engineering 53: 407-410 (2000)
ResumenElectron Cyclotron Resonance (ECR) plasma deposition process implies low temperatures at high deposition rates producing uniform and mechanically stable thin films. For these reasons ECR became an attractive tool for integrated optics technology. In this work we have combined ECR with other techniques as Reactive Ion Etching (RIE) and Pulsed Laser Deposition (PLD), in order to develop a new fabrication method of channel waveguides. We report here results on alumina-based strip-loaded waveguides. Amorphous Al2O3 core of 0.7 μm were deposited over Si/SiO2 substrate by PLD technique and overcladded with 0.5 μm SiO2-ECR film. Standard UV-photolitographic techniques and RIE were used to define a set of strips on the SiO2. These strips give the additional confinement of the light in the Al2O3 core. The optical losses at 633 nm were measured using an imaging technique. The relative scattered light power as function of the propagation along the channels shows a maximum optical loss of 4.5 dB/cm. © 2000 Elsevier Science B.V. All rights reserved.
URI http://hdl.handle.net/10261/87649
DOI10.1016/S0167-9317(00)00344-0
Identificadoresdoi: 10.1016/S0167-9317(00)00344-0
issn: 0167-9317
Aparece en las colecciones: (CFMAC-IO) Artículos
Ficheros en este ítem:
Fichero Descripción Tamaño Formato  
accesoRestringido.pdf15,38 kBAdobe PDFVista previa
Visualizar/Abrir
Mostrar el registro completo
 



NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.