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Low temperature electron cyclotron resonance plasma technique for low loss integrated optics

AutorPernas, P. L.; Ruíz, E.; Hernández, M. J.; Garrido, J.; García, B. J.; Castaño, J. L.; Requejo, J. M.; Solís Céspedes, Javier ; Serna, Rosalía ; Afonso, Carmen N.
Fecha de publicación2000
EditorElsevier
CitaciónMicroelectronic Engineering 53: 407-410 (2000)
ResumenElectron Cyclotron Resonance (ECR) plasma deposition process implies low temperatures at high deposition rates producing uniform and mechanically stable thin films. For these reasons ECR became an attractive tool for integrated optics technology. In this work we have combined ECR with other techniques as Reactive Ion Etching (RIE) and Pulsed Laser Deposition (PLD), in order to develop a new fabrication method of channel waveguides. We report here results on alumina-based strip-loaded waveguides. Amorphous Al2O3 core of 0.7 μm were deposited over Si/SiO2 substrate by PLD technique and overcladded with 0.5 μm SiO2-ECR film. Standard UV-photolitographic techniques and RIE were used to define a set of strips on the SiO2. These strips give the additional confinement of the light in the Al2O3 core. The optical losses at 633 nm were measured using an imaging technique. The relative scattered light power as function of the propagation along the channels shows a maximum optical loss of 4.5 dB/cm. © 2000 Elsevier Science B.V. All rights reserved.
URIhttp://hdl.handle.net/10261/87649
DOI10.1016/S0167-9317(00)00344-0
Identificadoresdoi: 10.1016/S0167-9317(00)00344-0
issn: 0167-9317
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