English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/87649
logo share SHARE logo core CORE   Add this article to your Mendeley library MendeleyBASE

Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar a otros formatos:


Low temperature electron cyclotron resonance plasma technique for low loss integrated optics

AuthorsPernas, P. L.; Ruíz, E.; Hernández, M. J.; Garrido, J.; García, B. J.; Castaño, J. L.; Requejo, J. M.; Solís Céspedes, Javier ; Serna, Rosalía ; Afonso, Carmen N.
Issue Date2000
CitationMicroelectronic Engineering 53: 407-410 (2000)
AbstractElectron Cyclotron Resonance (ECR) plasma deposition process implies low temperatures at high deposition rates producing uniform and mechanically stable thin films. For these reasons ECR became an attractive tool for integrated optics technology. In this work we have combined ECR with other techniques as Reactive Ion Etching (RIE) and Pulsed Laser Deposition (PLD), in order to develop a new fabrication method of channel waveguides. We report here results on alumina-based strip-loaded waveguides. Amorphous Al2O3 core of 0.7 μm were deposited over Si/SiO2 substrate by PLD technique and overcladded with 0.5 μm SiO2-ECR film. Standard UV-photolitographic techniques and RIE were used to define a set of strips on the SiO2. These strips give the additional confinement of the light in the Al2O3 core. The optical losses at 633 nm were measured using an imaging technique. The relative scattered light power as function of the propagation along the channels shows a maximum optical loss of 4.5 dB/cm. © 2000 Elsevier Science B.V. All rights reserved.
Identifiersdoi: 10.1016/S0167-9317(00)00344-0
issn: 0167-9317
Appears in Collections:(CFMAC-IO) Artículos
Files in This Item:
File Description SizeFormat 
accesoRestringido.pdf15,38 kBAdobe PDFThumbnail
Show full item record
Review this work

Related articles:

WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.