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Título: | Novel methods to pattern polymers for microfluidics |
Autor: | Martín, C. CSIC; Llobera, Andreu CSIC ORCID; Leïchlé, T.; Villanueva, Geronimo L.; Voigt, A.; Fakhfouri, V.; Kim, J. Y.; Berthet, N.; Bausells, Joan CSIC ORCID ; Gruetzner, G.; Nicu, L.; Bruegger, Juergen; Perez Murano, Francesc X. CSIC ORCID | Palabras clave: | Liquid spotter Microfluidics Hydrophobic barriers Soft-lithography Ink-jet |
Fecha de publicación: | 10-ene-2008 | Editor: | Elsevier | Citación: | Microelectronic Engineering 85 (2008) 972-975 | Resumen: | We present two novel methods for the preparation of arbitrary micro-scale patterns of polymers on surfaces with pre-defined topography. While photosensitive polymers are used commonly together with optical lithography, the methods presented can be used for nonphotostructurable polymers and where spin-coating cannot be performed. As demonstrator of the viability of the proposed fabrication process, they have been applied for the definition of hydrophobic barriers on a microfluidics network, which is dedicated to selectively dispense liquid to a spotting device consisting of 12 silicon microcantilevers. | Versión del editor: | http://dx.doi.org/10.1016/j.mee.2008.01.052 | URI: | http://hdl.handle.net/10261/7708 | DOI: | 10.1016/j.mee.2008.01.052 |
Aparece en las colecciones: | (IMB-CNM) Artículos |
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mee2008_polymers.pdf | 3,31 MB | Adobe PDF | Visualizar/Abrir |
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