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Attenuation lengths of high energy photoelectrons in compact and mesoporous SiO2 films

AuthorsFerrer, F. J. ; Gil-Rostra, J. ; González-García, Lola; Rubio-Zuazo, J. ; Romero-Gómez, Pablo ; López-Santos, Carmen ; Yubero, Francisco
Issue Date2012
CitationSurface Science 606(9-10): 820-824 (2012)
AbstractWe have experimentally evaluated attenuation lengths (AL) of photoelectrons traveling in compact and micro and mesoporous (∼ 45% voids) SiO 2 thin films with high (8.2-13.2 keV) kinetic energies. The films were grown on polished Si(100) wafers. ALs were deduced from the intensity ratio of the Si 1s signal from the SiO 2 film and Si substrate using the two-peaks overlayer method. We obtain ALs of 15-22 nm and 23-32 nm for the compact and porous SiO 2 films for the range of kinetic energies considered. The observed AL values follow a power law dependence on the kinetic energy of the electrons where the exponent takes the values 0.81 ± 0.13 and 0.72 ± 0.12 for compact and porous materials, respectively. © 2012 Elsevier B.V. All rights reserved.
DescriptionEl pdf del artículo es la versión post-print.
Publisher version (URL)http://dx.doi.org/10.1016/j.susc.2012.01.017
Identifiersdoi: 10.1016/j.susc.2012.01.017
issn: 0039-6028
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