English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/73339
logo share SHARE logo core CORE   Add this article to your Mendeley library MendeleyBASE

Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar a otros formatos:


Autocatalytic growth of Co on pure Co surfaces using Co2(CO)8 precursor

AuthorsCórdoba, R.; Sesé Monclús, Javier ; Ibarra, M. Ricardo; Teresa, José María de
Issue Date2012
CitationApplied Surface Science 263: 242-246 (2012)
AbstractThe autocatalytic growth of Co on different surfaces using the Co 2(CO)8 precursor is investigated. It is observed that Co2(CO)8 molecules dissociate spontaneously on pure Co surfaces grown by sputtering, forming a pure Co film. The microstructure of this film consists of Co nanocrystals with size below 100 nm. However, when the same type of experiment is done on a Co surface grown by focused-electron-beam induced deposition there is no autocatalytic growth of Co. On other surfaces such as Si substrates and Al films grown by sputtering, the spontaneous dissociation of the Co2(CO)8 molecules does not occur. The origin and implications of these results are discussed. © 2012 Elsevier B.V.
Identifiersdoi: 10.1016/j.apsusc.2012.09.037
issn: 0169-4332
Appears in Collections:(ICMA) Artículos
Files in This Item:
File Description SizeFormat 
accesoRestringido.pdf15,38 kBAdobe PDFThumbnail
Show full item record
Review this work

Related articles:

WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.