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Refractive index changes in amorphous SiO 2 (silica) by swift ion irradiation

AuthorsPeña Rodríguez, Ovidio ; Manzano-Santamaría, J.; Olivares Pascual, José; Rivera, A.; Agulló-López, F.
Issue Date2012
CitationNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 277: 126-130 (2012)
AbstractThe refractive index changes induced by swift ion-beam irradiation in silica have been measured either by spectroscopic ellipsometry or through the effective indices of the optical modes propagating through the irradiated structure. The optical response has been analyzed by considering an effective homogeneous medium to simulate the nanostructured irradiated system consisting of cylindrical tracks, associated to the ion impacts, embedded into a virgin material. The role of both, irradiation fluence and stopping power, has been investigated. Above a certain electronic stopping power threshold (∼2.5 keV/nm), every ion impact creates an axial region around the trajectory with a fixed refractive index (around n = 1.475) corresponding to a certain structural phase that is independent of stopping power. The results have been compared with previous data measured by means of infrared spectroscopy and small-angle X-ray scattering; possible mechanisms and theoretical models are discussed. © 2012 Elsevier B.V. All rights reserved.
Identifiersdoi: 10.1016/j.nimb.2011.12.057
issn: 0168-583X
Appears in Collections:(CFMAC-IO) Artículos
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