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Título: | Quantification of self-sputtering and implantation during pulsed laser deposition of gold |
Autor: | Perea, Ángel CSIC ORCID; Gonzalo, J. CSIC ORCID; Budtz-Jørgensen, C.; Epurescu, G.; Siegel, Jan CSIC ORCID ; Afonso, Carmen N. CSIC ; García López, J. CSIC ORCID | Fecha de publicación: | 2008 | Editor: | American Institute of Physics | Citación: | Journal of Applied Physics 104(8): 084912 (2008) | Resumen: | This work reports on the quantification of self-sputtering and implantation occurring during pulsed laser deposition of Au as a function of the laser fluence used to ablate the gold target. The experimental approach includes, on one hand, in situ electrical (Langmuir) and optical (two-dimensional imaging) probes for determining, respectively, ion and excited neutral kinetic energy distributions. On the other hand, it includes determination of the density of (i) ions reaching a substrate, and (ii) gold atoms deposited on a substrate as well as of a proportion of atoms that are self-sputtered. The experimental results supported by numerical analysis show that self-sputtering and implantation are both dominated by ions having kinetic energies ≥200 eV. They are a fraction 0.60-0.75 of the species arriving to the substrate for ablation laser fluences 2.7-9.0 J cm-2. Self-sputtering yields in the range 0.60-0.86 are determined for the same fluence range. © 2008 American Institute of Physics. | Versión del editor: | http://dx.doi.org/10.1063/1.2988145 | URI: | http://hdl.handle.net/10261/64828 | DOI: | 10.1063/1.2988145 | Identificadores: | doi: 10.1063/1.2988145 issn: 0021-8979 |
Aparece en las colecciones: | (CFMAC-IO) Artículos (CNA) Artículos |
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