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Surface morphology evolution of chemical vapor-deposited tungsten films on Si(100)

AuthorsVázquez, Luis ; Salvarezza, R. C.; Albano, E.; Arvia, A. J.; Hernández Creus, A.; Levy, Roi; Albella, J. M.
Issue Date1998
CitationChemical Vapor Deposition 4(3): 89-91 (1998)
AbstractCommunication: CVD tungsten films have many technological applications, and for most cases it is desirable to control the film surface structure. Several growth models have been proposed, but predictions have been difficult to check due to lack of systematic experiments. This work gives results for dynamics of LPCVD tungsten surfaces and makes a comparison with predicted behavior. A scanning tunneling microscopy image of a rough film is shown.
Identifiersissn: 0948-1907
Appears in Collections:(ICMM) Artículos
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