Surface morphology evolution of chemical vapor-deposited tungsten films on Si(100)

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DC Field	Value	Language
dc.contributor.author	Vázquez, Luis	-
dc.contributor.author	Salvarezza, R. C.	-
dc.contributor.author	Albano, E.	-
dc.contributor.author	Arvia, A. J.	-
dc.contributor.author	Hernández Creus, A.	-
dc.contributor.author	Levy, Roi	-
dc.contributor.author	Albella, J. M.	-
dc.date.accessioned	2012-12-12T08:54:44Z	-
dc.date.available	2012-12-12T08:54:44Z	-
dc.date.issued	1998	-
dc.identifier	issn: 0948-1907	-
dc.identifier.citation	Chemical Vapor Deposition 4(3): 89-91 (1998)	-
dc.identifier.uri	http://hdl.handle.net/10261/62533	-
dc.description.abstract	Communication: CVD tungsten films have many technological applications, and for most cases it is desirable to control the film surface structure. Several growth models have been proposed, but predictions have been difficult to check due to lack of systematic experiments. This work gives results for dynamics of LPCVD tungsten surfaces and makes a comparison with predicted behavior. A scanning tunneling microscopy image of a rough film is shown.	-
dc.language.iso	eng	-
dc.publisher	Wiley-VCH	-
dc.rights	closedAccess	-
dc.title	Surface morphology evolution of chemical vapor-deposited tungsten films on Si(100)	-
dc.type	artículo	-
dc.identifier.doi	http://dx.doi.org/10.1002/(SICI)1521-3862(199805)04:03<89::AID-CVDE89>3.0.CO;2-9	-
dc.date.updated	2012-12-12T08:54:44Z	-
dc.description.version	Peer Reviewed	-
Appears in Collections:	(ICMM) Artículos

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