English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/62173
logo share SHARE logo core CORE   Add this article to your Mendeley library MendeleyBASE

Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar a otros formatos:


ZnO inverse opals by chemical vapor deposition

AuthorsJuárez, Beatriz H.; García, Pedro David; Golmayo, Dolores ; Blanco Montes, Álvaro ; López, Cefe
Issue Date2005
CitationAdvanced Materials 17 (22): 2761-2765 (2005)
AbstractZinc oxide (ZnO) was grown in synthetic opals by using chemical vapor deposition (CVD) method. The CVD method yielded large area, high quality ZnO-polystyrene (PS) and ZnO inverse opals, with very precise control of degree of infiltration. ZnO was grown in thin PS opal films on silicon substrates, using a diluted solution of DMZn in hexane as zinc precursor. Double-distilled water (DDW) was used as a oxygen precursor. Inverse opals were obtained upon calcination of PS-ZnO composites at 450 degree C for 3 hours in air.
Identifiersdoi: 10.1002/adma.200500569
issn: 0935-9648
Appears in Collections:(ICMM) Artículos
Files in This Item:
File Description SizeFormat 
accesoRestringido.pdf15,38 kBAdobe PDFThumbnail
Show full item record
Review this work

WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.