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Title

Silicon direct opals

AuthorsIbisate, M. ; Golmayo, Dolores ; López, Cefe
Issue Date2009
PublisherWiley-VCH
CitationAdvanced Materials 21 (28): 2899-2902 (2009)
AbstractA study was conducted to demonstrate a process to fabricate silicon (Si) opals by magnesiothermic reduction of silica opals. The reduction of silica with gaseous Mg produced Si and magnesia keeping the structure unchanged, while the magnesia selective etching with HCl solutions allowed to obtain opals made of p-Si spheres. The porous nature of these p-Si spheres involved a lower dielectric constant than that of Si. X-ray diffraction, transmission electron microscopy (TEM), scanning electron microscopy (SEM), and optical spectroscopy were performed to monitor the process and analyze the crystal quality and composition of the samples. The spheres changed during the magnesiothermic reduction and CVD process were analyzed by TEM. The silica spheres (575nm diameter) produced by the standard Stöber method were treated at 600°C to prevent the appearance of cracks during the opal magnesiothermic reduction.
URIhttp://hdl.handle.net/10261/62164
DOI10.1002/adma.200900188
Identifiersdoi: 10.1002/adma.200900188
issn: 0935-9648
Appears in Collections:(ICMM) Artículos
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