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Growth of tin oxide in opal

AuthorsYates, H. M.; Pemble, M. E.; Blanco Montes, Álvaro ; Míguez, Hernán ; López, Cefe ; Meseguer, Francisco
Issue Date2000
CitationChemical Vapor Deposition 6 (6): 283-285 (2000)
AbstractTin oxide was chemical vapor deposited by alternate introduction of the precursors. The polycrystalline deposit was found to coat the opal spheres to a thickness of about 18 nm.
Identifiersissn: 0935-9648
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