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Ultraviolet laser-projection patterning of polymeric materials for electrochemical gas sensors

AuthorsTejedor, P.; Briones Fernández-Pola, Fernando
Issue Date1994
PublisherAmerican Institute of Physics
CitationApplied Physics Letters 64: 936-938 (1994)
AbstractArF laser ablation has been successfully applied to maskless pattern by projection lithography of two polymeric materials, polysiloxane and polyHEMA (2-hydroxy-ethyl methacrylate), to be used as gas diffusion membranes in electrochemical gas sensors. Etch rates up to 0.65 μm/s with smooth surface morphology, high edge definition, and a resolution of ∼5 μm were obtained using laser fluences between 250 and 400 mJ/cm2 and repetition rates between 1 and 10 Hz in air for polyHEMA films and in nitrogen for polysiloxane films.
Identifiersdoi: 10.1063/1.110950
issn: 0003-6951
Appears in Collections:(IMN-CNM) Artículos
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