English   español  
Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/50954
Título

Direct top-down ordering of diblock copolymers through nanoimprint lithography

AutorSalaun, Mathieu; Kehagias, N. ; Sotomayor Torres, C. M.
Fecha de publicación2011
EditorAmerican Institute of Physics
CitaciónJournal of Vacuum Science and Technology B 29(6): 06F208 (2011)
ResumenIn this work, thermal nanoimprint lithography (NIL) is used on full 8 in. silicon wafers to imprint a thin PS-b-PMMA block copolymer (BCP) layer. The authors show that the imprinted BCP layer can thermally self-organize after the NIL process or during the NIL process itself, depending on experimental conditions used. Self-organized imprinted features with good graphoepitaxy alignment are obtained with a cylindrical BCP. Nevertheless, a standard fluorinated silane mold treatment is shown not to be neutral to the BCP. Then, if the line features do not have a thickness exactly commensurable to the natural self-organizing period of the polymer l0, a surface wetting layer is observed. © 2011 American Vacuum Society.
URIhttp://hdl.handle.net/10261/50954
DOI10.1116/1.3662399
Identificadoresdoi: 10.1116/1.3662399
issn: 1071-1023
Aparece en las colecciones: (CIN2) Artículos
Ficheros en este ítem:
Fichero Descripción Tamaño Formato  
accesoRestringido.pdf15,38 kBAdobe PDFVista previa
Visualizar/Abrir
Mostrar el registro completo
 

Artículos relacionados:


NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.