English   español  
Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/2817
Compartir / Impacto:
Estadísticas
Add this article to your Mendeley library MendeleyBASE
Citado 20 veces en Web of Knowledge®  |  Ver citas en Google académico
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar otros formatos: Exportar EndNote (RIS)Exportar EndNote (RIS)Exportar EndNote (RIS)
Título : Development of a parallel local oxidation nanolithography instrument
Autor : Martínez Rodríguez, Luis Javier ; Sánchez Losilla, Nuria ; Biscarini, Fabio; Schmidt, Georg; Borzenko, Tanja; Molenkamp, Laurens W.; García García, Ricardo
Fecha de publicación : 22-ago-2006
Editor: American Institute of Physics
Citación : Review of Scientific Instruments 77, 086106 2006
Resumen: We have developed an instrument to perform local oxidation nanofabrication processes in parallel. The instrument has three major components, the stamp holder, the sample base, and the supporting frame. The sample base is actuated by three precision screws that enable motion in the three orthogonal directions. Sample base and stamp holder are enclosed and sealed inside a chamber with two inlets to introduce different gases. The chamber is supported by a rigid frame. We show the parallel patterning of silicon oxide features on silicon surfaces by the application of a bias voltage between the sample and the stamp when they are in contact. Arrays of parallel lines separated by 100 nm have been patterned over cm2 regions in one minute.
URI : http://hdl.handle.net/10261/2817
DOI: 10.1063/1.2336773
ISSN: 0034-6748
Aparece en las colecciones: (IMM-CNM) Artículos
Ficheros en este ítem:
Fichero Descripción Tamaño Formato  
development.pdf1,06 MBAdobe PDFVista previa
Visualizar/Abrir
Mostrar el registro completo
 



NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.