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Development of a parallel local oxidation nanolithography instrument

AutorMartínez Rodríguez, Luis Javier ; Sánchez Losilla, Nuria ; Biscarini, Fabio; Schmidt, Georg; Borzenko, Tanja; Molenkamp, Laurens W.; García García, Ricardo
Fecha de publicación22-ago-2006
EditorAmerican Institute of Physics
CitaciónReview of Scientific Instruments 77, 086106 2006
ResumenWe have developed an instrument to perform local oxidation nanofabrication processes in parallel. The instrument has three major components, the stamp holder, the sample base, and the supporting frame. The sample base is actuated by three precision screws that enable motion in the three orthogonal directions. Sample base and stamp holder are enclosed and sealed inside a chamber with two inlets to introduce different gases. The chamber is supported by a rigid frame. We show the parallel patterning of silicon oxide features on silicon surfaces by the application of a bias voltage between the sample and the stamp when they are in contact. Arrays of parallel lines separated by 100 nm have been patterned over cm2 regions in one minute.
URIhttp://hdl.handle.net/10261/2817
DOI10.1063/1.2336773
ISSN0034-6748
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