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Título: | Direct epitaxial growth of polar Hf0.5Zr0.5O2 films on corundum |
Autor: | Barriuso, Eduardo CSIC ORCID; Koutsogiannis, Panagiotis CSIC ORCID; Serrate, David CSIC ORCID ; Herrero Martín, Javier CSIC ORCID; Jiménez, Ricardo CSIC ORCID; Magén, César CSIC ORCID; Algueró, Miguel CSIC ORCID; Algarabel, Pedro A. CSIC ORCID; Pardo, José A. CSIC ORCID | Palabras clave: | Ferroelectricity Epitaxial strain Hafnium oxide Epitaxial growth |
Fecha de publicación: | 2022 | Editor: | Multidisciplinary Digital Publishing Institute | Citación: | Nanomaterials 12(7): 1232 (2022) | Resumen: | Single-phase epitaxial Hf0.5Zr0.5O2 films with non-centrosymmetric orthorhombic structure have been grown directly on electrode-free corundum (α-Al2O3) substrates by pulsed laser deposition. A combination of high-resolution X-ray diffraction and X-ray absorption spectroscopy confirms the epitaxial growth of high-quality films belonging to the Pca21 space group, with [111] out-of-plane orientation. The surface of a 7-nm-thick sample exhibits an atomic step-terrace structure with a corrugation of the order of one atomic layer, as proved by atomic force microscopy. Scanning transmission electron microscopy reveals that it consists of grains with around 10 nm lateral size. The polar nature of this film has been corroborated by pyroelectric measurements. These results shed light on the mechanisms of the epitaxial stabilization of the ferroelectric phase of hafnia. | Descripción: | This article belongs to the Special Issue Pulsed Laser Deposited Nanostructures. | Versión del editor: | https://doi.org/10.3390/nano12071232 | URI: | http://hdl.handle.net/10261/280215 | DOI: | 10.3390/nano12071232 | E-ISSN: | 2079-4991 |
Aparece en las colecciones: | (INMA) Artículos (ICMM) Artículos |
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