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Title

Nano-patterning of perpendicular magnetic recording media by low-energy implantation of chemically reactive ions

AuthorsMartín-González, Marisol; Briones Fernández-Pola, Fernando; García-Martín, José Miguel CSIC ORCID ; Montserrat, J.; Vila, L.; Faini, G.; Testa, A. M.; Fiorani, D.; Rohrmann, H.
KeywordsHard drive
Perpendicular magneticrecording
CoPd multilayer
Multilayer medium
Nanoimprint lithography
Issue Date27-Apr-2010
PublisherElsevier
CitationJournal of Magnetism and Magnetic Materials 322(2010)
AbstractMagnetic nanopatterning of perpendicular hard disc media with perpendicular anisotropy, but preserving disc surface planarity, is presented here. Reactive ion implantation is used to locally modify the chemical composition (hence the magnetization and magnetic anisotropy) of the Co/Pd multilayer in irradiated areas. The procedure involves low energy, chemically reactive ion irradiation through a resist mask. Among N, P and As ions, P are shown to be most adequate to obtain optimum bit density and topography flatness for industrial Co/Pd multilayer media. The effect of this ion contributes to isolate perpendicular bits by destroying both anisotropy and magnetic exchange in the irradiated areas. Low ion fluences are effective due to the stabilization of atomic displacements levels by the chemical effect of covalent impurities.
Publisher version (URL)http://dx.doi.org/10.1016/j.jmmm.2010.04.023
URIhttp://hdl.handle.net/10261/25972
DOI10.1016/j.jmmm.2010.04.023
ISSN0304-8853
Appears in Collections:(IMB-CNM) Artículos
(IMN-CNM) Artículos

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