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A study of the undercutting characteristics in the TMAH:IPA system

AuthorsMerlos Domingo, Ángel CSIC ORCID ; Acero Leal, María Cruz ; Bao, Min-Hang; Bausells, Joan CSIC ORCID ; Esteve i Tintó, Jaume
Issue Date1-Jun-1992
PublisherIOP Publishing
CitationJournal of Micromechanics and Microengineering 2(3): 181-183 (1992)
AbstractA new etching system of tetramethyl ammonium hydroxide-2-propanol (TMAH-IPA) is suggested. The undercutting ratio for TMAH at 80 degrees C is about 7, much higher than for KOH etchants. The addition of IPA in the TMAH system maintains the main features of TMAH and reduces the undercutting ratio by a factor of 2-3.
DescriptionTrabajo presentado en el Micromechanics Europe 1992 (MME'92), celebrado en Lovaina (Bélgica), los días 1 y 2 de junio de 1992
Publisher version (URL)
Identifiersdoi: 10.1088/0960-1317/2/3/014
issn: 0960-1317
e-issn: 1361-6439
Appears in Collections:(IMB-CNM) Comunicaciones congresos

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