English   español  
Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/22353
Compartir / Impacto:
Estadísticas
Add this article to your Mendeley library MendeleyBASE
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Título

Patterning of silicon surfaces with noncontact atomic force microscopy: Field-induced formation of nanometer-size water bridges

AutorGarcía García, Ricardo ; Calleja, Montserrat ; Rohrer, Heinrich
Fecha de publicaciónabr-1999
EditorAmerican Institute of Physics
CitaciónJournal of Applied Physics 86(4): 1898 (1999)
ResumenNanometer-size water bridges have been used to confine the oxidation of silicon surfaces with a noncontact atomic force microscope. The formation of a water bridge between two surfaces separated by a gap of a few nanometers is driven by the application of an electrical field. Once a liquid bridge is formed, its length and neck diameter can be modified by changing the tip-sample separation. The liquid bridge provides the ionic species and the spatial confinement to pattern Si(100) surfaces in noncontact force microscopy. The method is applied to write arrays of several thousands dots with a periodicity of 40 nm and an average width of 10 nm.
Descripción6 pages, 9 figures.
Versión del editorhttp://dx.doi.org/10.1063/1.370985
URIhttp://hdl.handle.net/10261/22353
DOI10.1063/1.370985
ISSN0021-8979
Aparece en las colecciones: (IMN-CNM) Artículos
(LFSPyN) Artículos
Ficheros en este ítem:
Fichero Descripción Tamaño Formato  
httpGetPDFServlet.pdf421,58 kBAdobe PDFVista previa
Visualizar/Abrir
Mostrar el registro completo
 

Artículos relacionados:


NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.