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dc.contributor.authorCarrero, Aneelyes_ES
dc.contributor.authorRoman, Augustoes_ES
dc.contributor.authorAguirre, Myriam H.es_ES
dc.contributor.authorSteren, Laura B.es_ES
dc.date.accessioned2020-09-03T09:04:29Z-
dc.date.available2020-09-03T09:04:29Z-
dc.date.issued2020-
dc.identifier.citationThin Solid Films 709: 138189 (2020)es_ES
dc.identifier.issn0040-6090-
dc.identifier.urihttp://hdl.handle.net/10261/219039-
dc.description.abstractA detailed nanoscale structural characterization was performed on high-quality La0.66Sr0.33MnO3 (LSMO) thin films of different thicknesses and deposited by pulsed laser deposition onto buffered Si (100) substrates. A multilayered structure built of Y0.13Zr0.87O2 (YSZ) and CeO2 layers was used as buffer in order to optimize the manganite films growth. The stacking of the different layers, their morpholohy, composition and strains were analysed using different experimental techniques. In-situ characterization of the films, performed with reflection high-energy electron diffraction, revealed their epitaxial growth and smooth surfaces. High-resolution transmission electron microscopy (HR-TEM) images showed sharp interfaces between the constituents lattices and combined with energy-dispersive X-ray analysis allowed us to determine that there was no ion interdifussion across them. The Fourier-Fast-Transform of the HR-TEM images was used to resolve the epitaxy relationship between the layers, resulting in [100] LSMO (001) ‖ [110] CeO2 (001) ‖ [110] YSZ (001) ‖ [110] Si (001). The LSMO thin films were found to be ferromagnetic and metallic at low temperature regardless their thickness. The effect of strains and defects was only detected in films thinner than 15 nm and put in evidence by X-ray diffraction patterns and correlated with magnetic and electrical parameters.es_ES
dc.description.sponsorshipThis work was supported by FONCYT PICT 2014-1047 and 2016-0867, CONICET PIP 112-201501-00213, MINCYT and the H2020-MSCA-RISE-2016 SPICOLOST (N° 734187) .es_ES
dc.language.isoenges_ES
dc.publisherElsevieres_ES
dc.relationinfo:eu-repo/grantAgreement/EC/H2020/734187es_ES
dc.rightsclosedAccesses_ES
dc.subjectNanoscale structurees_ES
dc.subjectOxideses_ES
dc.subjectPulsed laser depositiones_ES
dc.subjectFerromagnetismes_ES
dc.titleNanoscale structural characterization of manganite thin films integrated to silicon correlated with their magnetic and electric propertieses_ES
dc.typeartículoes_ES
dc.identifier.doihttp://dx.doi.org/10.1016/j.tsf.2020.138189-
dc.description.peerreviewedPeer reviewedes_ES
dc.relation.publisherversionhttps://doi.org/10.1016/j.tsf.2020.138189es_ES
dc.contributor.funderFondo Nacional de Desarrollo Científico y Tecnológico (Chile)es_ES
dc.contributor.funderComisión Nacional de Investigación Científica y Tecnológica (Chile)es_ES
dc.contributor.funderEuropean Commissiones_ES
dc.relation.csices_ES
oprm.item.hasRevisionno ko 0 false*
dc.identifier.funderhttp://dx.doi.org/10.13039/501100002850es_ES
dc.identifier.funderhttp://dx.doi.org/10.13039/501100000780es_ES
dc.identifier.funderhttp://dx.doi.org/10.13039/501100002848es_ES
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