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Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/21810

Fabrication of high quality factor photonic crystal microcavities in InAsP/InP membranes combining reactive ion beam etching and reactive ion etching

AutorMartínez Rodríguez, Luis Javier ; Prieto-González, Iván ; Alén, Benito ; Postigo, Pablo Aitor
Palabras claveElectron beam lithography
III-V semiconductors
Indium compounds
Optical fabrication
Fecha de publicación23-jun-2009
EditorAmerican Vacuum Society
CitaciónJournal of Vacuum Science and Technology - Section B 27(4): 1801-1804 (2009)
ResumenThe process of fabrication of high quality factor photonic crystal microcavities in slabs of InP with light emission at 1.5 µm is reported. The process includes e-beam lithography, reactive ion beam etching with a CHF3/N2 gas mixture, and reactive ion etching with a CH4/H2 gas mixture and O2 cycling. An InGaAs sacrificial layer is removed by chemical wet etching in order to obtain the photonic crystal membrane. Microphotoluminescense measurements have been performed to assess the quality of the fabricated structures. Quality factors up to (next) 30 000 and laser emission with thresholds of excitation pump power around 34 µW have been obtained.
Descripción4 pages.-- PACS: 42.70.Qs; 81.65.Cf; 85.40.Hp; 78.55.Cr; 81.16.Nd; 78.67.De
Versión del editorhttp://dx.doi.org/10.1116/1.3151832
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