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Positron annihilation analysis of nanopores and growth mechanism of oblique angle evaporated TiO2 and SiO2 thin films and multilayers

AuthorsGarcía-Valenzuela, A.; Butterling, Maik; Liedke, Maciej O.; Hirschmann, E.; Trinh, T.T.; Attallah, A.G.; Wagner, A.; Álvarez, Rafael ; Gil-Rostra, J. ; Rico, Víctor J. ; Palmero, Alberto ; González-Elipe, Agustín R.
KeywordsPositron annihilation
OAD thin films
Growing mechanism
Issue Date2020
PublisherElsevier BV
CitationMicroporous and Mesoporous Materials 295 (2020)
AbstractThe nano-porosity embedded into the tilted and separated nanocolumns characteristic of the microstructure of evaporated thin films at oblique angles has been critically assessed by various variants of the positron annihilation spectroscopy. This technique represents a powerful tool for the analysis of porosity, defects and internal interfaces of materials, and has been applied to different as-deposited SiO and TiO thin films as well as SiO/TiO multilayers prepared by electron beam evaporation at 70° and 85° zenithal angles. It is shown that, under same deposition conditions, the concentration of internal nano-pores in SiO is higher than in TiO nanocolumns, while the situation is closer to this latter in TiO/SiO multilayers. These features have been compared with the predictions of a Monte Carlo simulation of the film growth and explained by considering the influence of the chemical composition on the growth mechanism and, ultimately, on the structure of the films.
Publisher version (URL)http://dx.doi.org/10.1016/j.micromeso.2019.109968
Identifiersdoi: 10.1016/j.micromeso.2019.109968
issn: 1387-1811
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