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Ultrafast pump-probe and plasma emission microscopy during femtosecond laser processing

AuthorsSiegel, Jan
Issue Date11-Dec-2019
CitationSeminario en el Laboratoire Hubert Curien (2019)
AbstractFemtosecond laser processing of materials allows the fabrication of high-precision micro- and nanostructures for a wide field of applications. Yet, for an ultimate optimization of the fabricated structures, it is necessary to comprehend the highly complex transformation pathways of the material at the extreme excitation intensities used. The talk will provide an overview of the potential of ultrafast time-resolved microscopy for studying the interaction of ultrashort laser pulses with dielectrics, semiconductors and metals. The core technique is based on combining an optical pump-probe approach with optical microscopy, providing sub-picosecond temporal and micrometer spatial resolution, which can be extended by different imaging modalities. Applied to surface processing, femtosecond microscopy has the capability of resolving temporally and spatially numerous processes such as electron excitation, heating, melting, ablation, and solidification. It also has the ability to estimate the density and temporal evolution of laser-induced free-electron plasmas in dielectrics, visualize the optical Kerr effect, identify the occurrence of uncommon ablation mechanisms based on the expansion of a transparent thin shell, as well as resolving the formation of a heat-affected layer. When applied to sub-surface processing inside dielectrics, time-resolved microscopy is able to unveil highly complex interaction mechanisms, including self-focusing, beam filamentation and pre-focal energy depletion. The results shown demonstrate that an understanding of the process dynamics obtained by time-resolved microscopy is extremely useful for optimization of the obtained structures.
DescriptionSeminario,St. Etienne, Francia, December 11, 2019
Appears in Collections:(CFMAC-IO) Comunicaciones congresos
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