English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/211661
logo share SHARE logo core CORE   Add this article to your Mendeley library MendeleyBASE

Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL | DATACITE
Exportar a otros formatos:


Plume investigations of the mechanisms of SiO laser ablation at 266 nm

AuthorsJadraque, María ; Martín Muñoz, Margarita ; Santos Greve, Magna ; Díaz Sol, Luis ; Sawczak, Miroslaw; Cenian, Adam; Sliwinski, G.
Issue Date1-Apr-2007
PublisherInstitute of Physics (Great Britain)
CitationJournal of Physics: Conference Series 59: 293-296 (2007)
AbstractThe ablation mechanism of SiO at the laser wavelength of 266 nm has been investigated by characterizing the composition and dynamics of neutral and charged particles produced in the ablation. The neutral and ionized composition of the plume and the dynamics of neutral SiO were investigated by time-of-flight mass spectrometry. The velocity distribution of neutral SiO molecules shows contributions of slow and fast components. The velocity distributions of charged species in the plume were investigated by a Langmuir probe technique, obtaining that the distributions shift towards higher velocities with increasing distance from the target surface. The fastest component of the velocity distribution of neutral SiO overlaps the slowest part of the velocity distribution of charged species. The average rotational energy of SiO molecules, estimated by LIF spectroscopy does not allow to draw clear conclusions about the participation of silicon oxide ion clusters as the precursors of fast SiO molecules in the plume. © 2007 IOP Publishing Ltd.
Description4 pags., 2 figs. -- Eighth International Conference on Laser Ablation
Publisher version (URL)http://dx.doi.org/10.1088/1742-6596/59/1/061
Identifiersdoi: 10.1088/1742-6596/59/1/061
issn: 1742-6588
Appears in Collections:(CFMAC-IEM) Artículos
(IQFR) Artículos
Files in This Item:
File Description SizeFormat 
Plume investigations of the mechanisms of SiO laser ablation at 266 nm.pdf528,74 kBAdobe PDFThumbnail
Show full item record
Review this work

Related articles:

WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.