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dc.contributor.authorMuñoz, Manuel-
dc.contributor.authorQian, G. G.-
dc.contributor.authorKarar, N.-
dc.contributor.authorCheng, Hao-
dc.contributor.authorSaveliev, I. G.-
dc.contributor.authorGarcía García, Nicolás-
dc.contributor.authorMoffat, T. P.-
dc.contributor.authorChen, P. J.-
dc.contributor.authorGan, L.-
dc.contributor.authorEgelhoff Jr., W. F.-
dc.date.accessioned2010-02-15T11:45:13Z-
dc.date.available2010-02-15T11:45:13Z-
dc.date.issued2001-10-29-
dc.identifier.citationApplied Physics Letters 79(18): 2946 (2001)en_US
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10261/21078-
dc.description3 pages, 4 figures.en_US
dc.description.abstractWe present measurements of ballistic magnetoresistance in nanocontacts grown by electrodeposition of Ni microclusters on magnetic thin films covered by aluminum oxide layers, using a technique proposed by Schad et al. [D. Allen, R. Schad, G. Zangari, I. Zana, D. Yang, M. C. Tondra, and D. Wang, J. Vac. Sci. Technol. A. 18, 1830 (2000); Appl. Phys. Lett. 76, 407 (2000); D. Allen, R. Schad, G. Zangari, I. Zana, D. Yang, M. C. Tondra, D. Wang, and D. Reed, J. Appl. Phys. 89, 6662 (2001)]. The measurements are made on single Ni clusters in contact with a Ni and Co thin film. We measure the magnetoresistance and observe the relaxation of the magnetization and electrical resistance as a function of time. The clusters are electrodeposited under several different experimental conditions. Some are deposited randomly on an unpatterned film and some through various patterned photoresists that control the location at which the cluster is grown. The typical contact size is estimated from the electrical resistance to be 10–30 nm. Ballistic magnetoresistance values up to 14% are obtained in these first experiments.en_US
dc.format.extent170470 bytes-
dc.format.mimetypeapplication/pdf-
dc.language.isoengen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rightsopenAccessen_US
dc.titleBallistic magnetoresistance in a nanocontact between a Ni cluster and a magnetic thin filmen_US
dc.typeartículoen_US
dc.identifier.doi10.1063/1.1413734-
dc.description.peerreviewedPeer revieweden_US
dc.relation.publisherversionhttp://dx.doi.org/10.1063/1.1413734en_US
dc.type.coarhttp://purl.org/coar/resource_type/c_6501es_ES
item.openairetypeartículo-
item.cerifentitytypePublications-
item.languageiso639-1en-
item.grantfulltextopen-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.fulltextWith Fulltext-
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