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Título: | In-line metrology for roll-to-roll UV assisted nanoimprint lithography using diffractometry |
Autor: | Kreuzer, Martin CSIC ORCID; Whitworth, Guy L. CSIC ORCID; Francone, Achille CSIC ORCID; Gomis-Bresco, J. CSIC ORCID; Kehagias, N. CSIC ORCID; Sotomayor Torres, C. M. CSIC ORCID | Fecha de publicación: | 2018 | Editor: | AIP Publishing | Citación: | APL Materials 6(5): 058502 (2018) | Resumen: | We describe and discuss the optical design of a diffractometer to carry out in-line quality control during roll-to-roll nanoimprinting. The tool measures diffractograms in reflection geometry, through an aspheric lens to gain fast, non-invasive information of any changes to the critical dimensions of target grating structures. A stepwise tapered linear grating with constant period was fabricated in order to detect the variation in grating linewidth through diffractometry. The minimum feature change detected was ∼40 nm to a precision of 10 nm. The diffractometer was then integrated with a roll-to-roll UV assisted nanoimprint lithography machine to gain dynamic measurements in situ. | Versión del editor: | https://doi.org/10.1063/1.5011740 | URI: | http://hdl.handle.net/10261/199510 | DOI: | 10.1063/1.5011740 | E-ISSN: | 2166-532X |
Aparece en las colecciones: | (CIN2) Artículos |
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inlimetrol.pdf | 1,49 MB | Adobe PDF | Visualizar/Abrir |
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