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High aspect ratio and large area metallic nanogrids as transparent electrodes on optoelectronic devices

AuthorsPérez de San Román, Etor ; Prieto Aguilar, Iván ; Chaudhuri, Anabil; Neumann, Alexander; Brueck, Steven R. J.; Ripalda, José María
Issue Date2016
PublisherAmerican Institute of Physics
CitationJournal of Vacuum Science and Technology - Section B 34: 041224 (2016)
AbstractThe authors demonstrate high aspect ratio and large area metallic nanogrids as transparent electrodes with reduced series resistance on GaAs based optoelectronic devices. The fabrication process uses ultraviolet photolithography techniques, pulsed reactive ion etching, and two metallization steps: a vapor deposited contact seed layer and a thickening step by electrodeposition. As a result, a threefold reduction in resistive power losses is achieved with a contact grid transmission comparable to state-of-the-art devices.
Publisher version (URL)https://doi.org/10.1116/1.4954229
Appears in Collections:(IMN-CNM) Artículos
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