Lithography tools for patterning at the nanoscale

Abstract

In this talk, we will review tthe variety of litography techniques that allow the patterning of ordered structures at the nanoscale. First, the main characteristics of optical lithography will be described, indicating its different configurations, photoresist types, illuminating sources, the tailoring in the masks, or several etching processes. The focus on techniques using photons will be put on x-ray lithography and laser interference lithography. Then, some of the methods based in mechanical processes will be presented, including focus ion beam lithography and soft lithography. finally, different possibilities of using the tip of a scanning probe microscope for patterning will be discussed and relevant examples of bottom-up methods will be presented.