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Título: | Direct Patterning of p-Type-Doped Few-layer WSe2 Nanoelectronic Devices by Oxidation Scanning Probe Lithography |
Autor: | Dago, Arancha I.; Ryu, Y. K. CSIC ORCID; Palomares, F. Javier CSIC ORCID; García García, Ricardo CSIC ORCID | Palabras clave: | Few-layer tungsten diselenide Nanodevices Nanopatterning Oxygen plasma p-type doping Scanning probe lithography Transition-metal dichalcogenides |
Fecha de publicación: | 12-nov-2018 | Editor: | American Chemical Society | Citación: | ACS Applied Materials and Interfaces 10(46): 40054-40061 (2018) | Resumen: | Direct, robust, and high-resolution patterning methods are needed to downscale the lateral size of two-dimensional materials to observe new properties and optimize the overall processing of these materials. In this work, we report a fabrication process where the initial microchannel of a few-layer WSe2 field-effect transistor is treated by oxygen plasma to form a self-limited oxide layer on top of the flake. This thin oxide layer has a double role here. First, it induces the so-called p-doping effect in the device. Second, it enables the fabrication of oxide nanoribbons with controlled width and depth by oxidation scanning probe lithography (o-SPL). After the removal of the oxides by deionized H2O etching, a nanoribbon-based field-effect transistor is produced. Oxidation SPL is a direct writing technique that minimizes the use of resists and lithographic steps. We have applied this process to fabricate a 5 nm thick WSe2 field-effect transistor, where the channel consists in an array of 5 parallel 350 nm half-pitch nanoribbons. The electrical measurements show that the device presents an improved conduction level compared to the starting thin-layer transistor and a positive threshold voltage shift associated to the p-doping treatment. The method enables to pattern devices with sub-50 nm feature sizes. We have patterned an array of 10 oxide nanowires with 36 nm half-pitch by oxidation SPL. | Versión del editor: | https://doi.org/10.1021/acsami.8b15937 | URI: | http://hdl.handle.net/10261/172182 | DOI: | 10.1021/acsami.8b15937 | ISSN: | 1944-8244 | E-ISSN: | 1944-8252 |
Aparece en las colecciones: | (ICMM) Artículos |
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WSe2 nanoribbons_ACS Appl_Mat_Interf.pdf | 1,07 MB | Adobe PDF | Visualizar/Abrir |
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