Magnetic Force Microscopy Of Focused Ion Beam Patterned Co Antidot Arrays

Abstract

Continuous magnetic films with patterned groups of ordered holes, known as magnetic antidot arrays, are being intensively investigated as candidates for high-density storage media [1] and as magnonic crystals for magnetic logic applications [2]. The main parameters that influence the magnetic properties of the array are its symmetry and lattice constant and the shape and size of the antidots. The main focus of antidot arrays studies has been on square or hexagonal symmetry arrays of circular antidots, on the μm- and sub-μm-scale, fabricated by patterning methods like UV [3] or e-beam [4] lithography. On the other hand, nm-scale antidot arrays can be attained by various self-assembly techniques employing, e. g., porous anodic alumina [5] or colloidal lithography [6]. However, there are significant inherent drawbacks in all of the self-assembly fabrication methods, mainly regarding the limitations in the array symmetry and/or size and the extent of the symmetric domains, which is on the order of some μm.