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Electrodeposited Ni-Based Magnetic Mesoporous Films as Smart Surfaces for Atomic Layer Deposition: An “All-Chemical” Deposition Approach toward 3D Nanoengineered Composite Layers

AuthorsZhang, Jin; Quintana, Alberto; Menéndez, Enric; Coll, Mariona ; Pellicer, Eva; Sort, Jordi
KeywordsAtomic layer deposition
Magnetic properties
Mesoporous films
Nanoengineered composites
Surfactant-assisted electrodeposition
Issue Date23-May-2018
PublisherAmerican Chemical Society
CitationACS Applied Materials and Interfaces 10(17): 14877-14885 (2018)
AbstractMesoporous Ni and Cu-Ni (Cu20Ni80 and Cu45Ni55 in at. %) films, showing a three-dimensional (3D) porous structure and tunable magnetic properties, are prepared by electrodeposition from aqueous surfactant solutions using micelles of P-123 triblock copolymer as structure-directing entities. Pores between 5 and 30 nm and dissimilar space arrangements (continuous interconnected networks, circular pores, corrugated mesophases) are obtained depending on the synthetic conditions. X-ray diffraction studies reveal that the Cu-Ni films have crystallized in the face-centered cubic structure, are textured, and exhibit certain degree of phase separation, particularly those with a higher Cu content. Atomic layer deposition (ALD) is used to conformally coat the mesopores of Cu20Ni80 film with amorphous Al2O3, rendering multiphase "nano-in-meso" metal-ceramic composites without compromising the ferromagnetic response of the metallic scaffold. From a technological viewpoint, these 3D nanoengineered composite films could be appealing for applications like magnetically actuated micro/nanoelectromechanical systems (MEMS/NEMS), voltage-driven magneto-electric devices, capacitors, or as protective coatings with superior strength and tribological performance.
Publisher version (URL)http://dx.doi.org/10.1021/acsami.8b01626
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