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In-situ high-temperature X-ray diffraction of thin films: chemical expansion and kinetics

AuthorsSantiso, José ; Moreno, Roberto
X-ray diffraction
Oxygen non-stoichiometry
Chemical strain
Issue Date2017
PublisherSpringer Nature
CitationElectro-Chemo-Mechanics of Solids: 35-60 (2017)
SeriesElectronic Materials: Science & Technology
AbstractThis chapter reviews the use of in-situ X-ray diffraction analyses for exploring the chemical expansion produced by oxygen stoichiometry changes in thin oxide films during oxidation and reduction, as well as the kinetics of oxygen exchange at the surface of the films. This technique has demonstated to serve as a non-invasive and very selective complementary tool for fundamental studies on mixed ionic-electronic conducting materials.
Identifiersdoi: 10.1007/978-3-319-51407-9_3
isbn: 978-3-319-51405-5
Appears in Collections:(CIN2) Libros y partes de libros
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