Please use this identifier to cite or link to this item:
logo share SHARE logo core CORE BASE
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL | DATACITE

Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in-Plane Anisotropic ITO Thin Films

AuthorsParra-Barranco, J. CSIC ORCID; Sánchez-Valencia, J. R. ; Aparicio, Francisco J. CSIC ORCID CVN; Ferrer, F. J. CSIC ORCID; García-García, Francisco J. CSIC ORCID; Rico, Víctor J. CSIC ORCID; López-Santos, Carmen CSIC ORCID; Borrás, Ana CSIC ORCID; González-Elipe, Agustín R. CSIC ORCID; Barranco, Ángel CSIC ORCID
Issue Date2017
PublisherElectrochemical Society
CitationECS Transacctions 77(3): 9-15 (2017)
AbstractOblique angle deposition (OAD) is a powerful technique for the fabrication of porous nanostructured oxide thin films. OAD films typically present a columnar tilted nanostructure due to geometrical shadowing effects during the thin film growth. In this work, we study the fabrication of transparent and conducting indium tin oxide films (ITO) by OAD assisted by a microwave ECR plasma. The objective of assisting the deposition with a plasma discharge is to modify the growth mechanism of the OAD process introducing additional parameters to control the columnar microstructure, composition, porosity of the films. The results indicate the OAD ITO deposition assisted by the plasma discharge is a very effective process to develop in-plane structural anisotropy in the ITO nanocolumnar films what determines their electrical properties.
Publisher version (URL)htpp:// 10.1149/07703.0009ecst
Appears in Collections:(ICMS) Artículos

Files in This Item:
File Description SizeFormat
ECS Transaction_ DigitalCSIC.pdf434,37 kBAdobe PDFThumbnail
Show full item record
Review this work


checked on Nov 23, 2021

Google ScholarTM




WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.