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Cobalt(II)heteroarylalkenolate precursor for homogeneous Co3O4 coatings by atomic layer deposition

AutorBüyükyazi, Mehtap; Fischer, Thomas; Penmgei, Yu; Coll, Mariona ; Mathur, Sanjay
Fecha de publicación1-sep-2017
EditorRoyal Society of Chemistry (Great Britain)
CitaciónDalton Transactions: 10.1039/C7DT02757E (2017)
ResumenWe present a new and efficient cobalt precursor, CoII(DMOCHCOCF3)2, to prepare Co3O4 thin films and conformal coatings. In the synthesis of this Co complex, heteroaryl moieties and CF3-groups were combined leading to high thermal stability and volatility precursor. The suitability of this precursor for ALD deposition was tested on flat silicon substrates and TiO2/C nanofibers upon process optimization. Deposition at 200ºC results in homogeneous and smooth Co3O4 thin films with a growth per cycle of 0.02 nm/cycle. Conformal coatings have been successfully obtained on TiO2/C nanofibers being thus an attractive platform for surface chemistry studies on high aspect ratio structures for future photocatalysts, sensors, supercapacitors and batteries.
Versión del editorhttp://dx.doi.org/10.1039/C7DT02757E
URIhttp://hdl.handle.net/10261/154832
DOI10.1039/C7DT02757E
ISSN1477-9226
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