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Title

New process for high optical quality InAs quantum dots grown on patterned GaAs(001) substrates

AuthorsAlonso-González, Pablo CSIC ORCID ; González Sotos, Luisa ; González Díez, Yolanda; Fuster, David CSIC ORCID ; Fernández-Martínez, Iván CSIC; Martín-Sánchez, Javier; Abelmann, Leon
KeywordsQuantum dots
Patterned substrate
Laser interference lithography
Issue Date7-Aug-2007
PublisherInstitute of Physics Publishing
CitationNanotechnology
AbstractThis work presents a selective ultraviolet (UV)-ozone oxidation-chemical etching process that has been used, in combination with laser interference lithography (LIL), for the preparation of GaAs patterned substrates. Further molecular beam epitaxy (MBE) growth of InAs results in ordered InAs/GaAs quantum dot (QD) arrays with high optical quality from the first layer of QDs formed on the patterned substrate. The main result is the development of a patterning technology that allows the engineering of customized geometrical displays of QDs with the same optical quality as those formed spontaneously on flat non-patterned substrates.
Publisher version (URL)http://dx.doi.org/ 10.1088/0957-4484/18/35/355302
URIhttp://hdl.handle.net/10261/14929
DOI10.1088/0957-4484/18/35/355302
ISSN0957-4484
Appears in Collections:(IMN-CNM) Artículos

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