English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/147946
Share/Impact:
Statistics
logo share SHARE   Add this article to your Mendeley library MendeleyBASE
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar a otros formatos:

Title

Precursor competition in focused-ion-beam-induced co-deposition from W(CO)6 and C10H8

AuthorsSerrano-Esparza, Inés; Córdoba, R.; Ibarra, M. Ricardo; Teresa, José María de
KeywordsW(CO)6
FIBID
Co-deposits
Precursor competition
C10 H8
Issue Date2015
PublisherCognizant Communication Corporation
CitationScience Letters Journal 4: 127 (2015)
AbstractFocused-Ion-Beam-Induced Deposition (FIBID) is a direct-write lithography process aiming to produce functional deposits from a precursor gas and widely used in nanotechnology. Current developments in FIBID envision the use of two precursors simultaneously in order to produce binary compounds, enhancing the searched functionality. In the present work, we explore Focused-Ion-Beam-Induced co-deposition from simultaneous flux of W(CO)6 and C10H8 precursors. Contrary to expectations, we obtain inhomogeneous co-deposits, where areas of high W concentration and low C concentration segregate from areas with low W concentration and high C concentration, on top of significant sputtering effects due to the reduced growth rate. A subtle competition between the two precursor gases used plus the sputtering effect produced by Ga-ions are invoked to explain the obtained results. Our results highlight the potential of co-deposits using FIBID but underline the necessity of a better understanding of precursor competition to further development of this approach.
URIhttp://hdl.handle.net/10261/147946
Identifiersissn: 2454-7239
Appears in Collections:(ICMA) Artículos
Files in This Item:
File Description SizeFormat 
accesoRestringido.pdf15,38 kBAdobe PDFThumbnail
View/Open
Show full item record
Review this work
 


WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.