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Title

Advanced oxidation scanning probe lithography

AuthorsRyu, Y. K. ; García García, Ricardo
KeywordsScanning probe lithography
Local anodic oxidation
Oxidation SPL
Nanolithography
Nanopatterning
Issue Date8-Mar-2017
PublisherInstitute of Physics Publishing
CitationNanotechnology 28: 142003 (2017)
AbstractForce microscopy enables a variety of approaches to manipulate and/or modify surfaces. Few of those methods have evolved into advanced probe-based lithographies. Oxidation scanning probe lithography (o-SPL) is the only lithography that enables the direct and resist-less nanoscale patterning of a large variety of materials, from metals to semiconductors; from self-assembled monolayers to biomolecules. Oxidation SPL has also been applied to develop sophisticated electronic and nanomechanical devices such as quantum dots, quantum point contacts, nanowire transistors or mechanical resonators. Here, we review the principles, instrumentation aspects and some device applications of o-SPL. Our focus is to provide a balanced view of the method that introduces the key steps in its evolution, provides some detailed explanations on its fundamentals and presents current trends and applications. To illustrate the capabilities and potential of o-SPL as an alternative lithography we have favored the most recent and updated contributions in nanopatterning and device fabrication.
Publisher version (URL)https://doi.org/10.1088/1361-6528/aa5651
URIhttp://hdl.handle.net/10261/147154
DOI10.1088/1361-6528/aa5651
ISSN0957-4484
E-ISSN1361-6528
Appears in Collections:(ICMM) Artículos
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