English   español  
Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/14470
COMPARTIR / IMPACTO:
Estadísticas
logo share SHARE logo core CORE   Add this article to your Mendeley library MendeleyBASE

Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar a otros formatos:
Título

Atom and Ion Chemistry in Low Pressure Hydrogen DC Plasmas

AutorMéndez, Isabel; Gordillo Vázquez, Francisco J. ; Herrero, Víctor J. ; Tanarro, Isabel
Fecha de publicación14-abr-2006
EditorAmerican Chemical Society
CitaciónJournal of Physical Chemistry A 110(18): 6060-6066 (2006)
ResumenThe chemical composition of a low pressure hydrogen DC plasma produced in a hollow cathode discharge has been measured and modelled. The concentrations of H atoms and of H+, H2+ and H3+ ions were determined with a combination of optical spectroscopic and mass spectrometric techniques, over the range of pressures (p∼0.008-0.2 mbar) investigated. The results were rationalized with the help of a zero-order kinetic model. A comparatively high fraction (∼0.1 ± 0.05) of H atoms, indicative of a relatively small wall recombination, was observed. Low ionization degrees (< 10-4) were obtained in all cases. In general, the ionic composition of the plasma was found to be dominated by H3+, except at the lowest pressures, where H2+ was the major ion. The key physicochemical processes determining the plasma composition were identified from the comparison of experimental and model results, and are discussed in the paper.
Descripción7 pages, 5 figures, 2 tables.-- Printed version published May 11, 2006.
Versión del editorhttp://dx.doi.org/10.1021/jp057182+
URIhttp://hdl.handle.net/10261/14470
DOI10.1021/jp057182+
ISSN1089-5639
Aparece en las colecciones: (CFMAC-IEM) Artículos
(CFMAC-IO) Artículos
Ficheros en este ítem:
No hay ficheros asociados a este ítem.
Mostrar el registro completo
 

Artículos relacionados:


NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.