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Study of relaxation and transport processes by means of AFM based dielectric spectroscopy

AuthorsMiccio, Luis A.; Schwartz, G. A.
Issue Date2014
PublisherAmerican Institute of Physics
CitationAIP Conference Proceedings 1599: 150 (2014)
AbstractSince its birth a few years ago, dielectric spectroscopy studies based on atomic force microscopy (AFM) have gained a growing interest. Not only the frequency and temperature ranges have become broader since then but also the kind of processes that can be studied by means of this approach. In this work we analyze the most adequate experimental setup for the study of several dielectric processes with a spatial resolution of a few nanometers by using force mode AFM based dielectric spectroscopy. Proof of concept experiments were performed on PS/PVAc blends and PMMA homopolymer films, for temperatures ranging from 300 to 400 K. Charge transport processes were also studied by this approach. The obtained results were analyzed in terms of cantilever stray contribution, film thickness and relaxation strength. We found that the method sensitivity is strongly coupled with the film thickness and the relaxation strength, and that it is possible to control it by using an adequate experimental setup.
Identifiersdoi: 10.1063/1.4876800
issn: 0094-243X
e-issn: 1551-7616
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