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Fabrication of high quality factor GaAs/InAsSb photonic crystal microcavities by inductively coupled plasma etching and fast wet etching

AuthorsPrieto-González, Iván ; Muñoz-Camuñez, Luis Enrique ; González Taboada, Alfonso; Robles Urdiales, Carmen ; Ripalda, José María ; Postigo, Pablo Aitor
Issue Date2014
PublisherAmerican Vacuum Society
CitationJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 32: 011204 (2014)
AbstractThe authors demonstrate high quality factor GaAs-based L9 photonic crystal microcavities (PCMs) with embedded InAsSb quantum dots with emission in 1.3¿¿m at room temperature. The fabrication process uses reactive ion beam etching with a CHF3/N2 gas mixture and reactive ion etching with a BCl3/N2 gas mixture to form PCMs on air-suspended slabs. An optimum N2 partial flux content of 0.65 and a successful removal of deposits formed during the membrane release by a fast wet etching in HF provide optical quality factors (Q-factors) as high as ~30 000.
Publisher version (URL)http://dx.doi.org/10.1116/1.4836517
Identifiersissn: 0734-211X
Appears in Collections:(IMN-CNM) Artículos
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