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Título

Wear of aligned silicon nitride under dry sliding conditions

AutorBelmonte, Manuel; Miranzo López, Pilar; Osendi, María Isabel; Gomes, J. R.
Palabras claveWear
Silicon nitride
Grain alignment
Seeding
Microstructure
Fecha de publicación5-ene-2009
EditorElsevier
CitaciónWear 266(1-2): 6-12 (2009)
ResumenThe wear behaviour of textured silicon nitride (Si3N4) ceramics with aligned microstructures was analyzed under abrasive wear conditions. Dry reciprocating self-mated ball-on-flat wear tests were performed to study the influence of different microstructural plane/orientation combinations on the Si3N4 tribological behaviour. Textured materials showed superior wear resistance than non-textured reference Si3N4 for the whole range of loads and contact pressures, 5–50 N and 1.7–3.6 GPa, respectively, with an increase of about 70% for the maximum applied load. Within textured materials, the plane perpendicular to the extruding direction exhibited a 50% higher wear resistance (4 × 10−5 mm3 N−1 m−1) than the parallel plane where the elongated grains were aligned. The severe wear process involved debonding, fracture and debris formation mechanisms. The progress of this sequence depended on the particular microstructure of each plane/orientation combination. A relationship between abrasive wear resistance and selected microstructural parameters has been established.
Descripción7 pages, 10 figures, 1 table.-- Available online Jul 14, 2008.
Versión del editorhttp://dx.doi.org/10.1016/j.wear.2008.05.004
URIhttp://hdl.handle.net/10261/13181
DOI10.1016/j.wear.2008.05.004
ISSN0043-1648
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